fig3

CsCl interface-driven structural resilience of FAPbI<sub>3</sub> to humidity

Figure 3. Evolution of XRD patterns for the (A) control and (B) target films at three stages: pristine (bottom), humidity-exposed (middle), and post-exposure annealed (top). Humidity exposure was performed at 82%-88% RH for 30 min, followed by post-exposure annealing at 170 °C for 10 min. XRD: X-ray diffraction; RH: relative humidity.

Energy Materials
ISSN 2770-5900 (Online)
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