Volume 4, Issue 4 (2024) – 14 articles
Cover Picture: The cover picture of our mini review illustrates an atomic layer deposition (ALD) reaction process on a planar substrate, highlighting the marked contrast between the ALD-treated and untreated areas. The ALD-treated section demonstrates significantly improved surface uniformity and lattice structure, showcasing the potential of ALD technology in solar cell fabrication. Above the ALD layer are two transport pipelines for the reaction precursors, with three surrounding groups representing the state of the precursor as it approaches the substrate surface. The lower right corner displays the effect of temperature on ALD reactants. These elements collectively offer a detailed exploration of ALD's reaction mechanisms and a comprehensive review of how precursor materials, deposition temperatures, and substrates influence the growth and characteristics of ALD films. This visual representation not only aims to attract more scholars to explore the practical applications of ALD but also underscores the pivotal role of these research findings in advancing efficient and cost-effective solar technologies.
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